Definition of photoresist in English:

photoresist

noun ˌfəʊtəʊrɪˈzɪstˌfōdōrəˈzist

A photosensitive resist which, when exposed to light, loses its resistance or its susceptibility to attack by an etchant or solvent. Such materials are used in making microcircuits.
光阻材料，光致抗蚀剂
Example sentencesExamples
- When exposed to light, the photoresist undergoes a chemical change that alters its solubility in a certain solvent.
- The mask creates an interference pattern, exposing the photoresist in certain areas and leaving it unaffected in others.
- The researchers recorded the image onto a photoresist, a polymer coating on the other side of the superlens that becomes insoluble when exposed to UV light.
- The gold layers are structured by means of a process called photolithography, whereby light sensitive polymer resins or photoresists serve as masking material for the transfer of images onto the underlying substrate.
- An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed.

Definition of photoresist in US English:

photoresist

nounˌfōdōrəˈzist

A photosensitive resist which, when exposed to light, loses its resistance or its susceptibility to attack by an etchant or solvent. Such materials are used in making microcircuits.
光阻材料，光致抗蚀剂
Example sentencesExamples
- When exposed to light, the photoresist undergoes a chemical change that alters its solubility in a certain solvent.
- The researchers recorded the image onto a photoresist, a polymer coating on the other side of the superlens that becomes insoluble when exposed to UV light.
- An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed.
- The gold layers are structured by means of a process called photolithography, whereby light sensitive polymer resins or photoresists serve as masking material for the transfer of images onto the underlying substrate.
- The mask creates an interference pattern, exposing the photoresist in certain areas and leaving it unaffected in others.

词汇	photoresist
释义	Definition of photoresist in English: photoresist noun ˌfəʊtəʊrɪˈzɪstˌfōdōrəˈzist A photosensitive resist which, when exposed to light, loses its resistance or its susceptibility to attack by an etchant or solvent. Such materials are used in making microcircuits. 光阻材料，光致抗蚀剂 Example sentencesExamples When exposed to light, the photoresist undergoes a chemical change that alters its solubility in a certain solvent. The mask creates an interference pattern, exposing the photoresist in certain areas and leaving it unaffected in others. The researchers recorded the image onto a photoresist, a polymer coating on the other side of the superlens that becomes insoluble when exposed to UV light. The gold layers are structured by means of a process called photolithography, whereby light sensitive polymer resins or photoresists serve as masking material for the transfer of images onto the underlying substrate. An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed. Definition of photoresist in US English: photoresist nounˌfōdōrəˈzist A photosensitive resist which, when exposed to light, loses its resistance or its susceptibility to attack by an etchant or solvent. Such materials are used in making microcircuits. 光阻材料，光致抗蚀剂 Example sentencesExamples When exposed to light, the photoresist undergoes a chemical change that alters its solubility in a certain solvent. The researchers recorded the image onto a photoresist, a polymer coating on the other side of the superlens that becomes insoluble when exposed to UV light. An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed. The gold layers are structured by means of a process called photolithography, whereby light sensitive polymer resins or photoresists serve as masking material for the transfer of images onto the underlying substrate. The mask creates an interference pattern, exposing the photoresist in certain areas and leaving it unaffected in others.
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